Wei GROUP Laser Deposition Lab (MP 071)
Pulsed Laser
Deposition system
Our pulsed
laser deposition (PLD) system consists of an oxygen-compatible vacuum
chamber made by Neocera Inc. and an excimer laser made by Lambdaphysik.
The laser provides the high energies needed to ablate a wide range of
complex oxides, such as YBa2Cu3O6+x, La0.7Ca0.3MnO3 and LaNiO3.
The short pulse duration enables the plume to be deposited epitaxially,
in a layer-by-layer manner, onto lattice-compatible substrate
materials, such as LaAlO3 and SrTiO3. These oxide targets are 2-inch
ceramic pucks, mounted on a multiple-target carousel, which enables
pulse-by-pulse alternation of material during ablation, in a process
known as heteroepitaxy. The size of the ablated plume is
adjusted by varying the partial oxygen pressure in the chamber, thus
controlling the deposition kinetics. The substrate temperature is
also carefully controlled, to fine-tune the growth kinetics and
chemical stoichiometry of the films.
We are currently installing a second laser deposition system, donated from IBM T.J. Watson Research Center. This state-of-the-art system has a high-power excimer laser with adjustable wavelength, plus an ultra-high vacuum chamber which is equipped with RHEED and atomic oxygen source. The differentially-pumped RHEED gun provides real-time monitoring of the film deposition, to enable true layer-by-layer growth in unit-cell blocks approaching atomic smoothness. |